• All sections
  • H - Electricity
  • H10B - Electronic memory devices
  • H10B 43/27 - EEPROM devices comprising charge-trapping gate insulators characterised by three-dimensional arrangements, e.g. with cells on different height levels with source and drain on different levels, e.g. with sloping channels the channels comprising vertical portions, e.g. U-shaped channels

Patent holdings for IPC class H10B 43/27

Total number of patents in this class: 1324

10-year publication summary

0
0
0
0
3
11
209
416
429
255
2015 2016 2017 2018 2019 2020 2021 2022 2023 2024

Principal owners for this class

Owner
All patents
This class
Samsung Electronics Co., Ltd.
131630
292
Kioxia Corporation
9847
233
Micron Technology, Inc.
24960
174
SK Hynix Inc.
11030
154
Yangtze Memory Technologies Co., Ltd.
1940
146
Sandisk Technologies LLC
5684
85
Lodestar Licensing Group LLC
583
46
Applied Materials, Inc.
16587
22
Taiwan Semiconductor Manufacturing Company, Ltd.
36809
22
Macronix International Co., Ltd.
2562
21
Sunrise Memory Corporation
192
15
IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
1115
14
Semiconductor Energy Laboratory Co., Ltd.
10902
10
JPMorgan Chase Bank, National Association
10964
10
Institute of Microelectronics, Chinese Academy of Sciences
1290
10
Intel Corporation
45621
6
Tokyo Electron Limited
11599
6
Monolithic 3D Inc.
270
6
Lam Research Corporation
4775
5
Intel NDTM US LLC
373
5
Other owners 42